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专利名称：Guard ring structure and method for
forming the same
发明人：Chiyuan Lu,Chien-Chih Lin,Cheng-Chou
Hung,Yu-Hua Huang
申请号：US15186937申请日：20160620公开号：US09947627B2公开日：20180417
专利附图：
摘要：A guard ring structure having a semiconductor substrate with a circuit regionencircled by a first ring and a second ring. At least one of the first and second ring
includes: a plurality of separated doping regions formed in various top portions of thesemiconductor substrate, providing P-N junction or N-P junction on bottom of theplurality of separated doping regions; and an interconnect element formed over thesemiconductor substrate, covering at least portion of the plurality of separated dopingregions.
申请人：MediaTek Singapore Pte. Ltd.
地址：Singapore SG
国籍：SG
代理机构：McClure, Qualey & Rodack, LLP
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