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专利名称：Method for reproducing composition of
electrolytic polishing solution for niobiummaterial
发明人：Keisuke Tajiri,Hirotoshi Nomura申请号：US06/816379申请日：19860106公开号：US04676833A公开日：19870630
摘要：A method of reproducing a composition of an electrolytic polishing solution fora niobium material, characterized in that, when the composition of the electrolyticpolishing solution for the niobium material which is composed of HF, H.sub.2 SO.sub.4 andwater is lowered in the concentration of HF, the composition is replenished with
fluorosulfuric acid and water in an amount equimolar therewith or so in order to recoverthe concentration of HF while the content of water is maintained substantially at aconstant level.
申请人：MITSUBISHI JUKOGYO KABUSHIKI KAISHA
代理机构：Toren, McGeady & Associates
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