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专利名称：System and Method for Cleaning
Semiconductor Fabrication Equipment Parts
发明人：Samantha Tan申请号：US142092申请日：20140313
公开号：US20140190937A1公开日：20140710
专利附图：
摘要：An exemplary embodiment discloses a process for cleaning semiconductorfabrication equipment parts with non-metallic surfaces. The process optionally includesproviding a semiconductor fabrication part with a non-metallic surface to be cleaned and
applying a dilute aqueous solution to remove contamination from the non-metallicsurface. The aqueous solution optionally includes dilute amounts of hydrofluoric acid,nitric acid and hydrogen peroxide. The dilute amounts would optionally be in the rangesof 0.5-1.5% wt. hydrofluoric acid, 0.1-0.5% wt. nitric acid and 1-10% wt. hydrogenperoxide.
申请人：QUANTUM GLOBAL TECHNOLOGIES LLC
地址：Dublin PA US
国籍：US
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