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专利名称：Charged Particle Beam Apparatus发明人：Ryota WATANABE,Yuko SASAKI,Akira
IKEGAMI
申请号：US15183952申请日：20160616
公开号：US20160379795A1公开日：20161229
专利附图：
摘要：An object of the invention is to provide a charged particle beam apparatus whichcan perform optimized adjustment of a focusing condition of a charged particle beamfocused on a sample and optimized adjustment of an orbit of a charged particle emitted
from the sample. In order to achieve the above-described object, there is provided acharged particle beam apparatus including a passage restriction member that partiallyrestricts passage of a charged particle emitted from a sample, a first lens that is
arranged between the passage restriction member and the sample, and that controls anorbit of the charged particle emitted from the sample, and a second lens that is arrangedbetween the passage restriction member and the charged particle source, and thatchanges a focusing condition of the charged particle beam in accordance with a controlcondition of the first lens.
申请人：Hitachi High-Technologies Corporation
地址：Tokyo JP
国籍：JP
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