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Illumination optical system, exposure apparatus, a

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专利名称:Illumination optical system, exposure

apparatus, and device manufacturingmethod using the same

发明人:Kanjo Orino申请号:US11105866申请日:20050413公开号:US07170686B2公开日:20070130

专利附图:

摘要:Disclosed is an illumination optical system having an imaging optical system forimaging a predetermined object plane upon an image plane, by use of light supplied

from an integrator that functions to produce a plurality of light sources using light froma light source. In one preferred form of the invention, the imaging optical systemincludes, in an order from a light incidence side thereof, a first lens group having apositive power, a second lens group having a negative power, and a third lens grouphaving a positive power, wherein the second lens group includes a concave lens at a lightexit side thereof and wherein the third lens group includes a convex lens at a lightentrance side thereof. The position of intersection between an optical axis of the imagingoptical system and a principal ray of abaxial light is defined between the second lensgroup and the third lens group.

申请人:Kanjo Orino

地址:Tokyo JP

国籍:JP

代理机构:Morgan & Finnegan LLP

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